[EEJA WebSite]
Element Usage Plating Process Concen
tration
Preci
pitation efficiency
Current Density Application & Features
Gold Pure gold TEMPEREX 8400
TEMPEREX 209A
TEMPEREX 9500
MICROFAB AU 660
8
4
8
16
110~120 0.2~1.0
0.1~0.5
0.2~1.0
0.5~1.2
Semiconductor COB,TAP
wafer BUMP
Alloy AUTRONEX GVC(Au/Co)
AUTRONEX GVC-L(Au/Co)
AUTRONEX NI(Au/Ni)
8~18
4
8
20~30
10
30~40
10~150
0.5~10
0.3~1.5
CONNECTOR high speed electroplating
Electroless LECTROLESS Au
CERAGOLD 6070
- - - substitution/reducing
TYPE
STRIKE AUROBOND TN 1 - 1~8 Adhesive capacity elevation between material and gold plating
Silver   SILVERX II 80
24
3
63~67
67
67
1~5
1~2
1.5
gloss, pure silver plating solution, esp., connector, printer, wiring device
Palladium   PALLADEX LF4 3 28~33 0.25~1.0 Electronic components Semiconductor CONNECTOR
Rhodium   RHODEX
BRIGHT RHODIUM
SUPERRHODIUM
NO.1 SUPER WHITE
5
2
5
1
18
2~5
15
5
1.3
2.0
1.3
2.0
Industry, Ornament, esp., RHODEX is for lead switch
Platinum   PLATANEX 18 LS
PLATANEX SF
PLATINART 100
12
20
2
15~20
28~30
28~30
20
1~3
1~3
Plating solution
Ruthenium   RUTHENEX 10 10 1.0 high hardness, good corrosion resistance
Indium   INDEX 30 22 30 Non-gloss, highly-pure plating solution